AS ISO 17560-2006
Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon
Standards Australia , 10/20/2006
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Adopts ISO 17560:2002 to specify a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon and using stylus profilometry or optical interferometry for depth scale calibration.
Product Information
Published:
10/20/2006
Pages:
10
ISBN:
0733777872
File Size:
1 file , 770 KB
Language:
English
Note:
This product is unavailable in Ukraine, Russia, Belarus
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